i | Title of the course | MM 674:?Materials & Processes for Semiconductor Devices ? |
ii | Credit structure | L????????? T????????? P????????? C 6 ? ? ? ? ? 0 ? ? ? ? ?0? ? ? ? ? ?6 ? |
iii | Pre-requisite, if any | None ? |
iv | Course content | Pre-requisite: MM 474 and MM 372 Elemental and compound semiconductor materials, structural, electronic and optical properties. Theory of basic processing techniques: crystal growth, diffusion, oxidation, ion implantation, rapid thermal processing, epitaxy, chemical vapour deposition, and physical vapour deposition, metallization, the physics and chemistry of nonequilibrium plasmas. Emphasizes plasma etching.The interrelationship between material properties, fabrication techniques and device performance. ? |
v | Texts/References | S. Cambell, The Science & Engineering of Microelectronic Fabrication, Oxford, 1996.S.K. Ghandi, VLSI Fabrication Principles, 2nd Edition, Wiley 1994.Pierret/Neudeck, Modular Series and Solid State Devices, Vols. 1-5, Addison-Wesley, 1984.J.L. Vossen and W. Kern, Thin Film Processes, Academic Press, 1978.S.P. Mauraka and M.C. Peckerar, Electronic Materials Science and Technology, Academic Press, 1989. ? |
vi | Instructor(s) name | Prof. R.O.Dusane |